Layer system to form a surface layer on the surface of a substrate, coating process and substrate with a layer system

摘要

The layer system for forming an amorphous surface layers on a surface (2) of a substrate (3) such as tool, comprises a hard layer (6) produced by physical vapor deposition process, with a composition of silicon, boron, metal, nitrogen, carbon and oxygen (Si aB bMe cN uC vO w), with a, b greater than 0 and 25 at.% greater than c >= O and u, v, w >= 0. An external silicon-rich layer is equipped on the surface through which an oxygen diffusion is prevented into the layers and the hardness of the layer system is 2000-3500 Vickers. The layer system for forming an amorphous surface layers on a surface (2) of a substrate (3) such as tool, comprises a hard layer (6) produced by physical vapor deposition process, with a composition of silicon, boron, metal, nitrogen, carbon and oxygen (Si aB bMe cN uC vO w), with a, b greater than 0 and 25 at.% greater than c >= O and u, v, w >= 0. An external silicon-rich layer is equipped on the surface through which an oxygen diffusion is prevented into the layers and the hardness of the layer system is 2000-3500 Vickers. The first hard layer (5) is made of Si aB bMe cN uC vO wwith a, b greater than 0 and 33 at.% greater than c>= 0 and u, v, w >= 0, where Me is aluminum, chromium, molybdenum, tungsten, vanadium, niobium, tantalum, titanium, zirconium, hafnium, manganese, iron, cobalt, nickel, lithium, beryllium, magnesium, scandium, yttrium, lanthanum, cerium, neodymium and samarium. The metal portion in the layer system is 50 at.%. A composite layer made of Me xE yN zwith x greater than 0, y >= 0 and z greater than 0 is provided on the surface of the substrate, where E is element such as silicon, boron, carbon and oxygen. An intermediate layer having silicon and/or carbon is arranged between the substrate and the hard layer and/or between the composite layer and the hard layer and/or between the first hard layer and the hard layer. A gradient mixing layer (8) is arranged between the substrate and the hard layer and/or between the composite layer and the first hard layer and/or between the first hard layer and the hard layer and consists of elements of silicon and/or carbon of the intermediate layer and the composition of Si aB bMe cN uC vO wof the first hard layer. The layer thickness of the composite layer, the intermediate layer, the hard layer, the first hard layer, the gradient mixing layer and/or the cover layer is 80-600 nm. Independent claims are included for: (1) a coating process for applying a layer system; and (2) a substrate such as tool.