发明名称 Process for water treatment using high shear device
摘要 A method for removing contaminant from feedwater by forming a dispersion comprising bubbles of a treatment gas in a continuous phase comprising feedwater, wherein the bubbles have a mean diameter of less than about 5 μm and wherein the treatment gas is selected from air, oxygen, and chlorine. A method for removing contaminants from a feedwater by subjecting a fluid mixture comprising feedwater and a treatment gas to a shear rate greater than 20,000 s−1 in a high shear device to produce a dispersion of treatment gas in a continuous phase of the feedwater. A system for treating feedwater to remove contaminants therefrom is also presented, the system comprising at least one high shear mixing device comprising at least one generator comprising a rotor and a stator separated by a shear gap; and a pump configured for delivering feedwater and treatment gas to the high shear mixing device.
申请公布号 US7842184(B2) 申请公布日期 2010.11.30
申请号 US20080142447 申请日期 2008.06.19
申请人 H R D CORPORATION 发明人 HASSAN ABBAS;BAGHERZADEH EBRAHIM;ANTHONY RAYFORD G.;BORSINGER GREGORY;HASSAN AZIZ
分类号 B01D21/01;B01D35/00 主分类号 B01D21/01
代理机构 代理人
主权项
地址