| 摘要 |
<p>PURPOSE: A chemically-amplified type positive-tone composition is provided to effectively be imaged by 200 nm irradiation ray, for example, 193 nm irradiation ray. CONSTITUTION: A photoresist compound comprises a resin with the part selected from chemical formula 1-a and 1-b. In chemical formulas, R2 is the same or different non-hydro substituent, and each n is an integer of 0-4. A method for providing a photoresist relief image comprises the steps of: (a) applying the photoresist coating layer on a substrate; and (b) developing a coating layer of the exposed photoresist composition.</p> |
