发明名称 GAS INJECTING DEVICE FOR SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: A gas spraying device is provided to prevent the thermal deformation of a gas spray plate by receiving the thermal deformation through a sidewall comprised of a plurality of pieces. CONSTITUTION: A support plate(30) is combined with a chamber for processing a substrate. A gas inlet is formed on the support plate. A gas spray plate(40) is separated from the support plate. The gas spray plate or support plate is combined with one side of the sidewall unit.
申请公布号 KR20100125061(A) 申请公布日期 2010.11.30
申请号 KR20090044074 申请日期 2009.05.20
申请人 TES CO., LTD 发明人 MA, HEE JEON;HA, JOO IL
分类号 H01L21/205;H01L31/0392 主分类号 H01L21/205
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