发明名称 Microlens, method of manufacturing microlens, and photomask used for manufacturing method
摘要 A method of fabricating a microlens that serves to prevent damage thereto in the fabrication process is provided. First, a lens body of which the maximum height housed within a recess is lower than the height of the side wall of the recess is formed in the lens formation region by performing patterning that transfers the shape of a first resist pattern to a substrate by using the first resist pattern as an etching mask. Thereafter, a partial region of the substrate which is outside the lens formation region is removed to form an outline by using a second resist pattern as a mask.
申请公布号 US7843649(B2) 申请公布日期 2010.11.30
申请号 US20070790546 申请日期 2007.04.26
申请人 OKI SEMICONDUCTOR CO., LTD. 发明人 MAENO YOSHINORI
分类号 G02B3/08;B81B1/00;B81C1/00;G02B3/00;G02B7/02 主分类号 G02B3/08
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