发明名称 |
Microlens, method of manufacturing microlens, and photomask used for manufacturing method |
摘要 |
A method of fabricating a microlens that serves to prevent damage thereto in the fabrication process is provided. First, a lens body of which the maximum height housed within a recess is lower than the height of the side wall of the recess is formed in the lens formation region by performing patterning that transfers the shape of a first resist pattern to a substrate by using the first resist pattern as an etching mask. Thereafter, a partial region of the substrate which is outside the lens formation region is removed to form an outline by using a second resist pattern as a mask.
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申请公布号 |
US7843649(B2) |
申请公布日期 |
2010.11.30 |
申请号 |
US20070790546 |
申请日期 |
2007.04.26 |
申请人 |
OKI SEMICONDUCTOR CO., LTD. |
发明人 |
MAENO YOSHINORI |
分类号 |
G02B3/08;B81B1/00;B81C1/00;G02B3/00;G02B7/02 |
主分类号 |
G02B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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