发明名称 Crystalline semiconductor film and method for manufacturing the same
摘要 An island of a crystalline semiconductor according to the present invention has an upper surface and a sloped side surface, which are joined together with a curved surface. Crystal grains in a body portion of the island, including the upper surface, and crystal grains in an edge portion of the island, including the sloped side surface, both have average grain sizes that are greater than 0.2 μm.
申请公布号 US7843010(B2) 申请公布日期 2010.11.30
申请号 US20050663281 申请日期 2005.06.21
申请人 SHARP KABUSHIKI KAISHA 发明人 KIMURA TOMOHIRO;YASUMATSU TAKUTO
分类号 H01L23/62;H01L21/30 主分类号 H01L23/62
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