APPARATUS FOR SUPPLYING PRECURSOR AND SYSTEM FOR DEPOSITING THIN FILM WITH THE SAME

摘要

PURPOSE: An apparatus for supplying a precursor and a thin film depositing system including the same are provided to effectively prevent the condensation of the precursor due to the phase change of the precursor. CONSTITUTION: A vaporizer(22) supplies a vapor precursor into a processing chamber in which a vaporizing process with respect to a liquid precursor and a depositing process are performed. A liquid precursor transferring line(23) transfers the liquid precursor to the vaporizer. An orifice is arranged on the end part of the liquid precursor transferring line in order to spray the liquid precursor into the vaporizer. A downsizing unit is arranged on the end part of the liquid precursor transferring line in order to downsize the inner diameter of the liquid precursor transferring line.