| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in PEB temperature dependence, line edge roughness and pattern profile, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The positive resist composition contains: a resin containing a group having a lactone structure and having the solubility to an alkali developer solution increased by the effect of an acid; a compound generating a fluorine-substituted alkane sulfonic acid having 2 to 3 carbon atoms upon irradiation with active rays or radiation; and a solvent. The method for forming a pattern is carried out by using the composition. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
