| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce total processing time by efficiently processing drawing data in parallel. <P>SOLUTION: In the charged particle beam drawing device for drawing patterns on a sample M by applying charged particle beams 10a1b, data processing FRVFR1, dsVFR1 based on a figure in a virtual chip frame VFR1 is started by a parallel data processing section 10b1b1 and data processing FRVFR2, dsVFR2 based on a figure in a virtual chip frame VFR2 is started by a parallel data processing section 10b1b2 when dividing a virtual chip VCP into at least the virtual chip frames VFR1 and VFR2, and correction processing exVFR1 based on results of data processing FRVFR1, dsVFR1 by the parallel data processing section 10b1b1 is started by the parallel data processing section 10b1b1 at the completion of the data processing FRVFR1, dsVFR1 by the parallel data processing section 10b1b1 and before completing the data processing FRVFR2, dsVFR2 by the parallel data processing section 10b1b2. <P>COPYRIGHT: (C)2011,JPO&INPIT |
