发明名称 HOLDER UNIT, SUBSTRATE LAMINATING APPARATUS, AND ELECTROSTATIC DEVICE
摘要 PROBLEM TO BE SOLVED: To improve throughput of a substrate laminating apparatus. SOLUTION: The substrate laminating apparatus for laminating substrates having elements formed includes three or more processing units for applying treatment on the substrates and a conveyance unit for carrying the substrate to each of the three or more processing units. One of the three or more processing units is a position aligner for aligning the substrates in position with one another for lamination, and the respective three or more processing units are disposed on a circumference around the turning center of the conveyance unit. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010267821(A) 申请公布日期 2010.11.25
申请号 JP20090118061 申请日期 2009.05.14
申请人 NIKON CORP 发明人 TANAKA KEIICHI
分类号 H01L21/02;H01L21/683;H02N13/00 主分类号 H01L21/02
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