发明名称 Inspection Apparatus, Lithographic Apparatus and Method of Measuring a Property of a Substrate
摘要 A piezo-electric material is placed adjacent to the path of the radiation beam such that, when power is applied to the piezo-electric material it rotates into the path of the radiation beam to block it. A smaller and lighter radiation beam shutter therefore results.
申请公布号 US2010296072(A1) 申请公布日期 2010.11.25
申请号 US20080746055 申请日期 2008.11.21
申请人 ASML NETHERLANDS B.V. 发明人 BASELMANS WILHELMUS JACOBUS
分类号 G03B27/54;G01N21/55 主分类号 G03B27/54
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