发明名称 |
Inspection Apparatus, Lithographic Apparatus and Method of Measuring a Property of a Substrate |
摘要 |
A piezo-electric material is placed adjacent to the path of the radiation beam such that, when power is applied to the piezo-electric material it rotates into the path of the radiation beam to block it. A smaller and lighter radiation beam shutter therefore results.
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申请公布号 |
US2010296072(A1) |
申请公布日期 |
2010.11.25 |
申请号 |
US20080746055 |
申请日期 |
2008.11.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BASELMANS WILHELMUS JACOBUS |
分类号 |
G03B27/54;G01N21/55 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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