| 发明名称 |
Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System |
| 摘要 |
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
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| 申请公布号 |
US2010294648(A1) |
申请公布日期 |
2010.11.25 |
| 申请号 |
US20100704123 |
申请日期 |
2010.02.11 |
| 申请人 |
FEI COMPANY |
发明人 |
KELLER JOHN;SMITH NOEL;BOSWELL RODERICK;SCIPIONI LAWRENCE;CHARLES CHRISTINE;SUTHERLAND ORSON |
| 分类号 |
C23C14/46;C23C16/00;H01J27/02;H01J37/08 |
主分类号 |
C23C14/46 |
| 代理机构 |
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