发明名称 |
DIAZASILACYCLOPENTENE DERIVATIVE, PROCESS FOR PRODUCING THE SAME AND PROCESS FOR PRODUCING SILICON-CONTAINING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a novel silicon compound which has a high vapor pressure and comes to an excellent material in producing a silicon-containing film and a process for producing the same in a good yield by using a danger-free inexpensive raw material. SOLUTION: A diazasilacyclopentene derivative represented by formula (1) is produced by reacting a diimine, in other words, a 1,4-diaza-1,3-butadiene derivative with an alkali metal and a tetraalkyl orthosilicate, and the silicon-containing film is produced by using the same. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010265257(A) |
申请公布日期 |
2010.11.25 |
申请号 |
JP20100051638 |
申请日期 |
2010.03.09 |
申请人 |
TOSOH CORP;SAGAMI CHEMICAL RESEARCH INSTITUTE |
发明人 |
TADA KENICHI;IWANAGA KOHEI;CHIBA YOICHI;YAMAMOTO TOSHIKI;MANIWA ATSUSHI;YOTSUYA TADAHIRO;OSHIMA KENSHO |
分类号 |
C07F7/10;C23C16/42;H01L21/205;H01L21/316 |
主分类号 |
C07F7/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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