| 摘要 |
PROBLEM TO BE SOLVED: To form a pattern with high definition while efficiently cooling a tension mask with a low efficiency of heat transfer. SOLUTION: In a vapor deposition process of forming a pattern by depositing a film-forming material on a substrate 4 through a mask 5 which is a tension mask using a mask foil, this vapor deposition method includes a step of determining whether the mask which has been used for the vapor deposition can be reused or not, without cooling the mask. The same mask is repeatedly used for a plurality of substrates, as long as the mask can be used. When the mask is determined as not to be reusable, the mask is transported to a mask stock chamber 2 having a cooling unit 14, is cooled there, is returned to a vapor deposition chamber 1, and is reused. COPYRIGHT: (C)2011,JPO&INPIT
|
