发明名称 |
Oxidkomplexlaminat, Verfahren zur Herstellung eines Oxidkomplexlaminats und Vorrichtung |
摘要 |
<p>A complex oxide laminate including: a substrate; a first complex oxide layer represented by a general formula ABO 3 formed above the substrate; and a second complex oxide layer represented by a general formula AB 1-x C x O 3 formed above the first complex oxide layer, an element A including at least Pb, an element B including at least one of Zr, Ti, V, W, and Hf, and an element C including at least one of Nb and Ta.</p> |
申请公布号 |
DE602006017480(D1) |
申请公布日期 |
2010.11.25 |
申请号 |
DE20066017480T |
申请日期 |
2006.08.10 |
申请人 |
SEIKO EPSON CORP. |
发明人 |
KIJIMA, TAKESHI;OHASHI, KOJI;HAMADA, YASUAKI |
分类号 |
H01L21/316;H01L21/02;H01L21/8246;H01L27/105;H01L27/115;H01L41/09;H01L41/187;H01L41/318;H01L41/39;H03H3/08;H03H9/25 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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