| 摘要 |
<p>A resist composition comprising an alkali-soluble epoxy compound (A) having a specific structure, a photo-acid generator (B), and a cyclic ether compound (C) having a viscosity of 10 to 20000 mPa·s at 25°C, wherein the content of the cyclic ether compound (C) is 16 to 47% by mass relative to the total amount of the alkali-soluble epoxy compound (A), the photo-acid generator (B) and the cyclic ether compound (C).</p> |
