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发明名称
Method And Chamber For Inductively Coupled Plasma Processing For Cylinderical Material With Three-dimensional Surface
摘要
申请公布号
KR100995700(B1)
申请公布日期
2010.11.22
申请号
KR20080067915
申请日期
2008.07.14
申请人
发明人
分类号
H01L21/02
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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