发明名称 GAS-WIPING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a gas-wiping device which can improve the productivity by enabling maintenance including a replacement of a wiping nozzle without shutting down a line or cutting the steel plate. SOLUTION: The gas-wiping device 11 is used for adjusting the mass of a plated film by jetting a gas from the wiping nozzle 12 toward the front surface and the rear surface of a strip S which travels upward from a hot-dip plating bath 10. The wiping nozzle 12 is supported so as to be linearly movable for a distance of the nozzle width or longer toward the sheet width direction of the strip S. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010261076(A) 申请公布日期 2010.11.18
申请号 JP20090113132 申请日期 2009.05.08
申请人 MITSUBISHI-HITACHI METALS MACHINERY INC 发明人 FUJIOKA HIRONORI;YONEKURA TAKASHI;YOSHIKAWA MASASHI
分类号 C23C2/20 主分类号 C23C2/20
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