| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam device capable of maintaining an electric field near an electron emission element in the vicinity of a spacer at an approximately fixed level irrespective of relative position relationship between the surface of the spacer and the electron emission element in the vicinity of the spacer. SOLUTION: The electron beam device has a spacer which has an insulating base material and a high resistance film for covering the surface of the base material and is located between a first substrate and a second substrate. The spacer has a first facing surface facing by coming in contact with a first conductive member, a second facing surface facing by coming in contact with a second conductive member, and a side surface continued to the first and second facing surfaces and adjoined to a track of electrons emitted from the electron emission element, and is electrically connected to the first conductive member and the second conductive member via the high resistance film. When a sheet resistance value of the first facing surface is denoted by R<SB>1</SB>and a sheet resistance value of the side surface is denoted by R<SB>2</SB>, a value of R<SB>2</SB>/R<SB>1</SB>becomes 2-200. A part of the first facing surface comes in contact with the first conductive member, and a section between a part of the first facing surface and the side surface does not come in contact with the first conductive member. COPYRIGHT: (C)2011,JPO&INPIT
|
