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发明名称
Method of forming isolation film of semiconductor memory device
摘要
申请公布号
KR100994891(B1)
申请公布日期
2010.11.16
申请号
KR20070018981
申请日期
2007.02.26
申请人
发明人
分类号
H01L21/762
主分类号
H01L21/762
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代理人
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