| 摘要 |
<p>The present invention relates to an inductively coupled plasma processing apparatus, and more specifically, to an inductively coupled processing apparatus capable of processing plasma by smart control of a diffusion pump. According to the present invention, the inductively coupled plasma processing apparatus includes a vacuum chamber, a plasma generator, a gas feeder and an exhaust unit, wherein the exhaust unit comprises a diffusion pump; an auxiliary pump; a primary exhaust line, which is connected to the vacuum chamber and the diffusion pump, has a throttle valve and serves as an exhaust passage; and a secondary exhaust line, which is connected to the vacuum chamber, the diffusion pump and the auxiliary pump, has main and auxiliary valves and serves as an exhaust passage. With such a diffusion pump, the plasma processing apparatus of the present invention has significantly low failure rates compared to other plasma processing apparatuses employing a turbo-molecular pump, lowers maintenance costs to a great extent and provides a good-quality high density plasma processing operation.</p> |
