发明名称 METHOD FOR MANUFACTURING HIGH PURITY POLYCRYSTALLINE SILICON
摘要 An method for manufacturing a high purity polycrystalline silicon is characterized by comprising: supplying a silicon chloride gas from a silicon chloride gas supply nozzle and a zinc gas from a zinc gas supply nozzle into a vertical reactor, and generating downward a polycrystalline silicon agglomerated in an almost tube shape on the leading end part of the silicon chloride gas supply nozzle by the reaction of the silicon chloride gas and the zinc gas.
申请公布号 US2010284886(A1) 申请公布日期 2010.11.11
申请号 US20100841452 申请日期 2010.07.22
申请人 CHISSO CORPORATION 发明人 NAMIKI NOBUAKI
分类号 C01B33/03 主分类号 C01B33/03
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