| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist application apparatus for a color filter capable of reducing a corner level difference easily formed at a part where a black matrix and a colored pixel overlap. SOLUTION: In the application apparatus, colored resist 3 is applied on the surface of a substrate 1 which is made horizontal before spinning, the substrate 1 is rotated for 180 degrees, fixed to a board rotating stage 12 in the state of turning a resist application surface downward and highly spinned, and the colored resist 3 is applied. The application apparatus has at least a slit coater part, a spin coater part and a mechanism for turning the resist application surface downward and moving the substrate to the spin coater part. COPYRIGHT: (C)2011,JPO&INPIT |
