| 摘要 |
<p>PURPOSE: A CD uniformity improvement method is provided to improve CD uniformity by applying an OPC model which reflects the property of a device and a process. CONSTITUTION: An optical proximity correction model data collection process is executed in order to progress an exposure process which uses a reticle including a plurality of chips. An optical proximity correction model, which maximizes processing capability in the plurality of chips from the collected model data, is determined. The reticle is manufactured by reflecting each optical proximity correction model.</p> |
