Resin for photoresist composition, photoresist composition and method for forming resist pattern

摘要

A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in theα-position to the hydroxyl group has at least one electron attractive group.