发明名称 |
System and method for using a two part cover and a box for protecting a reticle |
摘要 |
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
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申请公布号 |
US7830497(B2) |
申请公布日期 |
2010.11.09 |
申请号 |
US20070785548 |
申请日期 |
2007.04.18 |
申请人 |
ASML HOLDING N.V. |
发明人 |
DEL PUERTO SANTIAGO;LOOPSTRA ERIK R.;MASSAR ANDREW;KISH DUANE P.;ALIKHAN ABDULLAH;OLSEN WOODROW J.;FEROCE JONATHAN H. |
分类号 |
G03B27/32;G03F1/16;B65G49/07;G03B27/42;G03B27/48;G03B27/52;G03B27/58;G03B27/62;G03F1/14;G03F1/24;G03F1/62;G03F1/64;G03F1/66;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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