发明名称 |
Photomask and method for forming wiring pattern using the same |
摘要 |
A photomask includes a transparent mask substrate, and a plurality of square mask cells provided on the mask substrate. Each mask cell includes at least one of a light transmitting region and a light shielding region. A planar region (in which the mask cells are formed) of the mask substrate includes a first region, a second region surrounding the first region, and a third region outside the second region. The first region includes a first group of mask cells transmitting lights of a first light intensity greater than zero and less than or equal to 1. The second region includes a second group of mask cells transmitting lights of a second light intensity greater than zero and less than the first light intensity. The third region includes a third group of mask cells transmitting lights of a third light intensity greater than or equal to zero and less than the second light intensity.
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申请公布号 |
US7829247(B2) |
申请公布日期 |
2010.11.09 |
申请号 |
US20070892082 |
申请日期 |
2007.08.20 |
申请人 |
OKI SEMICONDUCTOR CO., LTD. |
发明人 |
MAENO YOSHINORI |
分类号 |
G03C5/00;G03F1/00;G03F1/68;H01L21/027;H01L21/3205;H01L21/768 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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