发明名称 Plasma processor electrode and plasma processor
摘要 A plasma processor electrode includes a support member disposed to face to an electrode that holds a substrate to be treated, an electrode plate fixed to the support member and equipped with gas injection holes and a screw hole open and facing to the support member to supply a processing gas through the gas discharge hole into a processing space formed between the electrode plate and the electrode to generate a plasma in the processing space, and a fastening unit that clamps the electrode plate on the support member by fastening the electrode plate to the support member with a screw driven into the screw hole from the support member.
申请公布号 US7827931(B2) 申请公布日期 2010.11.09
申请号 US20040508699 申请日期 2004.09.29
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUSHIMA KEIICHI;SUZUKI TAKASHI;FURUYA HAJIME
分类号 C23C16/50;H01L21/3065;C23C16/455;C23C16/503;C23C16/505;C23F1/00;H01J37/32;H01L21/306 主分类号 C23C16/50
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