发明名称 |
Plasma processor electrode and plasma processor |
摘要 |
A plasma processor electrode includes a support member disposed to face to an electrode that holds a substrate to be treated, an electrode plate fixed to the support member and equipped with gas injection holes and a screw hole open and facing to the support member to supply a processing gas through the gas discharge hole into a processing space formed between the electrode plate and the electrode to generate a plasma in the processing space, and a fastening unit that clamps the electrode plate on the support member by fastening the electrode plate to the support member with a screw driven into the screw hole from the support member.
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申请公布号 |
US7827931(B2) |
申请公布日期 |
2010.11.09 |
申请号 |
US20040508699 |
申请日期 |
2004.09.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MATSUSHIMA KEIICHI;SUZUKI TAKASHI;FURUYA HAJIME |
分类号 |
C23C16/50;H01L21/3065;C23C16/455;C23C16/503;C23C16/505;C23F1/00;H01J37/32;H01L21/306 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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