发明名称 |
RESIST INK AND METHOD OF FORMING RESIST PATTERN USING THE RESIST INK |
摘要 |
PURPOSE: A resist ink and a resist pattern formation method using thereof are provided to simply form a micro-metal wiring with a small and simple device without containing solid materials generating inferior goods. CONSTITUTION: A resist ink contains a resin particle formed with a heat fusing type resin, and a solvent capable of dispersing the resin particle without dissolving the resin particle. The parameter difference of the solubility of the resin particle and the solvent is more than 2.5(cal/cm^3)^1/2. A resist pattern formation method using the resist ink comprises the following steps: printing a pattern on a substrate using the resist ink by an inversion printing method; and heating the pattern to melt the resin particle. |
申请公布号 |
KR20100118526(A) |
申请公布日期 |
2010.11.05 |
申请号 |
KR20100038965 |
申请日期 |
2010.04.27 |
申请人 |
KABUSHIKI KAISHA HITACHI SEISAKUSHO(D/B/A HITACHI, LTD.) |
发明人 |
FUNAHATA KATSUYUKI;SASAKI HIROSHI |
分类号 |
B41M1/02;C09D11/00;C09D11/033;C09D11/10;C09D11/103;C23F1/00;G03F7/004;G03F7/26;H05K3/00 |
主分类号 |
B41M1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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