| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus and a film forming method in which discharge variability due to temperature differences in the discharge heads is prevented without a deterioration in productivity due to waiting time. SOLUTION: The film-forming apparatus 1 is characterized in comprising a stage 2 for mounting a substrate P; a discharge head 3; maintenance devices 5, 6, 7 for performing maintenance of the discharge head 3; and a chamber 8 for accommodating the stage 2, the discharge head 3, and the maintenance device 5 to 7, wherein a drawing area E1, a maintenance area E2 and a transport device 25 for moving the discharge head 3 between the drawing area E1 and the maintenance area E2 are provided inside the chamber 8. A first air conditioner 55 for supplying a gas having a prescribed temperature is provided to the chamber 8 to adjust the temperature of the drawing area E1. An air conditioner control device 57 is provided to the first air conditioner 55 to control the first air conditioner 55 so that the supply of the gas to the drawing area E1 may be stopped while the discharge head 3 is positioned in the maintenance area E2. COPYRIGHT: (C)2011,JPO&INPIT
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