| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, which is free from problems of a radiation-sensitive acid generator, having a perfluoroalkyl sulfonyl structure such as PFOS (perfluoro-n-octane sulfonic acid), which has characteristics of excellent resolution performance, no vaporization of an acid generated by exposure, and an appropriately short diffusion length, and which gives a small LWR (line width roughness) as an index of fluctuation in the line width of a resist pattern, and can give a resist pattern having a small film reduction. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) a radiation-sensitive acid generator, having a partial fluoroalkyl structure and (B) a resin having a specified cyclic carbonate structure. <P>COPYRIGHT: (C)2011,JPO&INPIT |
