PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING METHOD, PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING DEVICE, AND PHOTOELECTRIC CONVERSION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photoelectric conversion device manufacturing method which controls the depth of a processing groove to a desired value.

SOLUTION: The method for manufacturing the photoelectric conversion device 10 has a groove formation step which applies a pico-second laser to an intermediate contact layer separation groove 15 constituting the photoelectric conversion device 10 and forms a processing groove 15 in a predetermined scan direction by relatively moving the pico-second laser against the intermediate contact layer separation groove 15. In the groove formation step, the pico-second laser is relatively moved so that interference fringes are arranged in parallel in one direction within a radiation range equivalent to the beam diameter of the pico-second laser, and that the interference fringes are connected in the scan direction.

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