Illumination system for micro lithographic projection system utilized for microlithography of e.g. electronic component, has optical element arranged in level directly in front of entry surface, and exhibiting refraction power

摘要

The system has a glass rod (5) producing homogenous intensity distribution of a projection light at an outlet area (5a) of the rod, which possesses rectangular cross section. A zoom lens (2) and a coupling lens (4) are provided in a light path in front of the rod for production of light distribution in an entry surface (5e) of the rod. An optical element (50) e.g. cylindrical lens and zoom-system, is arranged in a level directly in front of the entry surface, which optically faces a laser (1) i.e. krypton fluoride laser. The optical element exhibits continuous changeable refraction power.