| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a copolymer having a desired composition and performance. <P>SOLUTION: The method for producing the copolymer for a resist includes: a structural unit derived from a (meth)acryl monomer having at least one of acetal group; and a structural unit derived from at least one of other (meth)acryl monomer copolymerizable with the above monomer. The method uses monomers wherein the whole amount of halogen compounds included in the monomer raw material is not more than 200 ppm with respect to the whole amount of the monomers as polymerization raw materials. <P>COPYRIGHT: (C)2011,JPO&INPIT |
