发明名称 METHOD FOR ADJUSTING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for adjusting an optical system that reduces residual aberration of the optical system in a short time. <P>SOLUTION: The method for adjusting the optical system has: a step of computing aberration sensitivity to each parameter of the optical system; a step of measuring the aberration of the optical system as a correction target aberration; a step of computing the adjustment amount for correcting the correction aberration and a first aberration variation when adjusting only the amount of adjustment using the aberration sensitivity; a step of computing a second aberration variation corresponding to the adjustment amount using ray trace; a step of computing difference between the first aberration variation and the second aberration variation; and a step of deciding whether the difference is in an allowable value. When the difference is not in the allowed value, the sum of the last correction target aberration and the second aberration variation is set as a new correction target aberration. When the difference is in the allowances value, the optical system is adjusted based on the sum total of the adjustment amount. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010251462(A) 申请公布日期 2010.11.04
申请号 JP20090098171 申请日期 2009.04.14
申请人 CANON INC 发明人 KATASHIBA YUJI;MORISHIMA HIDEKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址