发明名称 PELLICLE, MASK, MASK FORMING APPARATUS, MASK FORMING METHOD, EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, AND FOREIGN MATTER DETECTING APPARATUS
摘要 <p>A protective apparatus protects a predetermined area on a surface of a substrate. The protective apparatus includes: a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the predetermined area; and a thin film portion that is stretched across the frame portion to oppose the predetermined area and closes an opening portion formed by the frame portion. An end surface of the flexible portion on the thin film portion side has a curved shape which is concave toward a connecting portion with the substrate.</p>
申请公布号 WO2010126166(A1) 申请公布日期 2010.11.04
申请号 WO2010JP57914 申请日期 2010.04.28
申请人 NIKON CORPORATION;HANAZAKI NORITSUGU 发明人 HANAZAKI NORITSUGU
分类号 G03F1/14 主分类号 G03F1/14
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