| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition having an effect of improving a spread bottom profile of a resist pattern, with which a pattern having few pattern collapse defects is formed, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The composition includes (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, and (C) a resin containing at least either a fluorine atom or a silicon atom and containing a polarity conversion group that is decomposed by an action of an alkali developing solution to increases the solubility with the alkali developing solution, wherein the resin component (A) contains a repeating unit obtained from an ester compound expressed by general formula (1). In general formula (1), A<SP>1</SP>represents a polymerizable functional group having a carbon-carbon double bond; A<SP>2</SP>represents a divalent group selected from furan-diyl, tetrahydrofuran-diyl and oxanorbornan-diyl; R<SP>1</SP>and R<SP>2</SP>each independently represent a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group; or R<SP>1</SP>and R<SP>2</SP>may be bonded to form an aliphatic hydrocarbon ring together with carbon atoms bonding thereto; and R<SP>3</SP>represents a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group which may include a hydrogen atom or a hetero atom. <P>COPYRIGHT: (C)2011,JPO&INPIT |
