发明名称 SUBSTRATE INSPECTION DEVICE AND SUBSTRATE OBSERVATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate inspection device and a substrate observation device which improves an S/N ratio by emphasizing fine concentration fluctuation generated on a colored film applied onto a substrate by an optical filter, and performing quality determination of extremely fine concentration fluctuation. SOLUTION: The substrate inspection device includes a camera 22 including an imaging element, a stage for grasping the substrate, an illumination means 24 for illuminating the substrate from the rear of the stage, a control means for controlling a shutter of the camera, the optical filter 21 for allowing transmission of only a wavelength band having a low light transmittance of the substrate on the front surface of an imaging lens of the camera and/or the illumination means, a recording means for accumulating and preserving images obtained from the camera, and a determination means for performing quality determination based on the image. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010249844(A) 申请公布日期 2010.11.04
申请号 JP20100178403 申请日期 2010.08.09
申请人 TOPPAN PRINTING CO LTD 发明人 SAITO JUNICHI;TANIZAWA KEIICHI
分类号 G01N21/958;G01M11/00 主分类号 G01N21/958
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