发明名称 BONDED STRUCTURE AND BONDING METHOD FOR BONDED STRUCTURE
摘要 On the surface (102b) of a semiconductor element (102), a metal layer (105) having a crystal lattice different from that of a bonding material (106) having Bi as a main component is disposed, and a layer (104) composed of an element having a positive value of heat of formation of a compound with the bonding material (106) is disposed between the metal layer (105) having the crystal lattice different from that of the bonding material (106) and the surface (102b) of the semiconductor element (102). Thus, the components of the metal layer (105) having the crystal lattice different from that of the bonding material (106) are prevented from diffusing in the semiconductor element (102).
申请公布号 WO2010125800(A1) 申请公布日期 2010.11.04
申请号 WO2010JP02999 申请日期 2010.04.27
申请人 PANASONIC CORPORATION;FURUSAWA, AKIO;SAKATANI, SHIGEAKI;KITAURA, HIDETOSHI;NAKAMURA, TAICHI;MATSUO, TAKAHIRO 发明人 FURUSAWA, AKIO;SAKATANI, SHIGEAKI;KITAURA, HIDETOSHI;NAKAMURA, TAICHI;MATSUO, TAKAHIRO
分类号 H01L21/52;C22C12/00;H01L21/3205;H01L23/52 主分类号 H01L21/52
代理机构 代理人
主权项
地址