发明名称 |
MULTIPLE PHASE RF POWER FOR ELECTRODE OF PLASMA CHAMBER |
摘要 |
RF power is coupled with different phase offsets to different RF connection points on an electrode of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply, wherein each power supply synchronizes its phase to a common reference RF oscillator. |
申请公布号 |
EP2245912(A2) |
申请公布日期 |
2010.11.03 |
申请号 |
EP20090820920 |
申请日期 |
2009.01.31 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WHITE, JOHN, M.;STIMSON, BRADLEY, O. |
分类号 |
H05H1/36;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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