发明名称 Memory cell with buried digit line
摘要 A memory cell, array and device include an active area formed in a substrate with a vertical transistor including a first end disposed over a first portion of the active area. The vertical transistor is formed as an epitaxial post on the substrate surface extends from the surface of the substrate, and includes a gate formed around a perimeter of the epitaxial post. A capacitor is formed on the vertical transistor and a buried digit line vertically couples to a second portion of the active area. An electronic system and method for forming a memory cell are also disclosed.
申请公布号 US7825452(B2) 申请公布日期 2010.11.02
申请号 US20070829618 申请日期 2007.07.27
申请人 MICRON TECHNOLOGY, INC. 发明人 EPPICH ANTON P.
分类号 H01L27/108 主分类号 H01L27/108
代理机构 代理人
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