发明名称 GRADATION MASK AND METHOD FOR MANUFACTURING GRADATION MASK
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gradation mask that easily forms a translucent area in which difference in transmittance is adjusted with sufficient accuracy even when the difference in transmittance between the translucent areas is small. <P>SOLUTION: The gradation mask is provided which has: a transparent substrate; a light-shielding film directly formed on the transparent substrate and comprising a light-shielding film-forming material; a translucent film directly formed on the transparent substrate and comprising a translucent film-forming material; and a transmittance adjusting layer directly formed on the translucent film and comprising a transmittance adjusting layer-forming material. The gradation mask includes: a transmissive area comprising the transparent substrate; a light-shielding area at least including the transparent substrate and the light-shielding film; a first translucent area comprising the transparent substrate and the translucent film; and a second translucent area comprising the transparent substrate, the translucent film, and the transmittance adjusting layer, wherein an average transmittance of the transmittance adjusting layer within a wavelength range of 350-450 nm is 60% or more. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010243598(A) 申请公布日期 2010.10.28
申请号 JP20090089427 申请日期 2009.04.01
申请人 DAINIPPON PRINTING CO LTD 发明人 TAKAHASHI MASAYASU
分类号 G03F1/54;G03F1/58 主分类号 G03F1/54
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