发明名称 |
SLURRY COMPOSITION AND METHOD OF FABRICATING DAMASCENE STRUCTURE USING THE SAME |
摘要 |
<p>A slurry composition has an amount of 100 % and includes abrasives, an acid- base pH adjustor, an oxidant and water. A content of the abrasives is 10 wt% to 40 wt%, and a polydisperse index of the abrasives sizes is greater than 1.8. A content of the acid-base pH adjustor is 0.01 wt% to 10 wt%. A content of the oxidant is 0.01 wt% to 10 wt%. A remaining portion of the slurry composition is water. No suitable figure.</p> |
申请公布号 |
SG165218(A1) |
申请公布日期 |
2010.10.28 |
申请号 |
SG20090051913 |
申请日期 |
2009.08.04 |
申请人 |
UWIZ TECHNOLOGY CO., LTD. |
发明人 |
CHANG, SONG-YUAN;TSAI, WEN- TSAI;LU, MING-HUI;SHEN, PO-YUAN |
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