| 发明名称 |
HYDROPHILIC COMPOSITION AND PURIFICATION METHOD OF ALKOXYSILYL-CONTAINING MONOMER |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a hydrophilic composition having a less content of impurities such as inorganic ions. SOLUTION: The hydrophilic composition contains a hydrophilic polymer formed from an alkoxysilyl-containing monomer having a group expressed by general formula (A):-Si(R<SP>104</SP>)<SB>3-p</SB>(OR<SP>105</SP>)<SB>p</SB>and having a water content of not more than 1.0 mass% and an inorganic ion content of not more than 500 ppm. In general formula (A), R<SP>104</SP>and R<SP>105</SP>each independently represents a hydrogen atom or a hydrocarbon group; and p represents an integer of 1 to 3. COPYRIGHT: (C)2011,JPO&INPIT
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| 申请公布号 |
JP2010241846(A) |
申请公布日期 |
2010.10.28 |
| 申请号 |
JP20090088515 |
申请日期 |
2009.03.31 |
| 申请人 |
FUJIFILM CORP |
发明人 |
MURAYAMA YUICHIRO;UCHIDA OSAMU;OGASAWARA HIDEKI |
| 分类号 |
C08F30/08;C08F2/00;C08F2/38;C09K3/00 |
主分类号 |
C08F30/08 |
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