APPARATUS AND METHOD FOR POLISHING

摘要

PROBLEM TO BE SOLVED: To further reduce consumption of a polishing liquid while keeping a relatively high polishing rate. SOLUTION: An apparatus of polishing includes: a polishing table 22 having a polishing surface 52a; a top ring 24 for holding a polishing object W while pressing the polishing object W against the polishing surface 52a; a polishing liquid supply nozzle 26 connected with a polishing liquid supply line 72 for supplying a polishing liquid Q to the polishing surface 52a; a polishing liquid amount monitor means 60 for monitoring a polishing liquid amount on the polishing surface 52a during polishing; and a liquid amount adjusting part 74 for adjusting the amount of the polishing liquid Q supplied from the polishing liquid supply nozzle 26 to the polishing surface 52a in response to an output from the polishing liquid amount monitor means 60. COPYRIGHT: (C)2011,JPO&INPIT