| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus for treating a substrate which efficiently uses a cleaning liquid used for a nozzle initializing mechanism, while a piping constitution can be simplified. <P>SOLUTION: The nozzle maintenance unit 9 of the apparatus 1 for treating a substrate includes a roller 95, a roller bat 96 housing the roller 95, a nozzle cleaning unit 40 used for cleaning a nozzle, and a standby bat 41 which is waited by the nozzle cleaning unit 40. The roller bat 96 and the standby bat 41 are connected to each other via a connecting pipe 42, and a solution on the standby bat 41 is all fed to the roller bat 96. Therefore, all the cleaning liquid and the treated liquid discharged from a slit nozzle 55 and the nozzle cleaning unit 40 are stored in the roller bat 96 once and can be reused for cleaning the outer peripheral surface of the roller 95 discharged with the treated liquid as pre-discharge. Additionally, since what is necessary is just to install an exhaust air pipe 25, an overflow waste-liquid pipe 23 and a roller-bat waste-liquid pipe 24 in the roller bat 96, the piping constitution is simplified. <P>COPYRIGHT: (C)2011,JPO&INPIT |
