MASTERING METHOD, MASTERING DEVICE AND SUBSTRATE MASTER

摘要

The invention relates to a mastering method for producing a substrate master, a mastering device for producing a substrate master and a substrate master, in particular for use in an optical storage media replication process, the mastering method comprising the following steps: providing a substrate (1) with a substantially planar surface (11); coating the planar surface (11) of the substrate (1) with a patterning layer (3); and patterning the patterning layer (3) by exposing the patterning layer to a patterning radiation (5) at one or more writing spots (33) along an exposure path (31), such that a thickness modulation or a continuous change of thickness is induced in the patterning layer (3) along the exposed exposure path (31).