| 发明名称 |
Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues |
| 摘要 |
Minimization of developed photosensitive compositions is realized through use of a photoinitiator of hexaarylbiimidazole compound having at least one hydrophilic group.
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| 申请公布号 |
US6180319(B1) |
申请公布日期 |
2001.01.30 |
| 申请号 |
US19980038584 |
申请日期 |
1998.03.11 |
| 申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
MCKEEVER MARK R. |
| 分类号 |
G03F7/031;G03F7/029;G03F7/30;G03F7/42;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/031 |
| 代理机构 |
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