| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the efficiency of forming a plurality of kinds of exposure patterns on the same subject to be exposed. <P>SOLUTION: After exposure of a first exposure region 9 of a subject 8 to be exposed is completed using a first mask pattern group 12 of a photomask 11 while transferring the subject 8 to be exposed in the arrow A direction, light emitted from a light source is interrupted by moving a shutter 5 in synchronization with the transfer speed of the subject 8 to be exposed, and the subject 8 to be exposed is returned in the arrow D direction by a distance for which the subject 8 to be exposed has moved during a time when the shutter 5 moved, and the mask pattern group is switched to the second mask pattern group 13 by moving the photomask 11, and when the switching of the mask pattern group of the photomask 11 is completed, transfer of the subject 8 to be exposed in the arrow A direction is restarted, and at the same time, the shutter 5 is moved in the arrow B direction in synchronization with the transfer speed of the subject 8 to be exposed and interruption of light emitted from the light source is stopped, and exposure of the second exposure region 10 is performed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
