| 摘要 |
A relative linear motion apparatus comprising: a first structure having at least a pair of inner wall surfaces opposing to each other; a second structure arranged between the pair of inner wall surfaces, the second structure being movable in linear motion relative to the first structure; at least two rectilinear guides arranged between the first structure and the second structure; and a displacement absorbing device arranged on at least one of the first structure and the second structure so as to allow at least one of the two rectilinear guides to move in a intersecting direction against the wall surfaces. |
